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Презентация на тему Optical identification using imperfections in 2D materials

IntroductionThe ability to uniquely identify an object or device is important for authentication. Imperfections, locked into structures during fabrication, can be used to provide a fingerprint that is challenging to reproduce.
Optical identification using imperfections in 2D materials IntroductionThe ability to uniquely identify an object or device is important for   ObjectiveTo analise a proposed simple optical technique to read unique information from nanometer-scale defects in 2D materials.  TasksMethodResults for WS2 from mechanically exfoliationResults for WS2 from chemical vapor depositionConclusion MethodMeasurement apparatus, in which the photoluminescence from a monolayer TMD is collected Angular orientations of the BPF determines the center-wavelength of its pass band, Concept of the angular selective transmissionChanging the BPF angle lights up a Makeup of PUFThe BPF angular orientation θ, the corresponding BPF bandwidth, and the Results for WS2 from mechanically exfoliation   50× Optical image of the Results for WS2 from chemical vapor depositionAngular-dependent PL images of  monolayer flake, excited Angular dependent PL images of WS2 monolayer flake, excited by 450 nm laser, ConclusionSpatial non-uniform photoluminescence is more pronounced for chemical vapor grown flakes than
Слайды презентации

Слайд 2 Introduction
The ability to uniquely identify an object or

IntroductionThe ability to uniquely identify an object or device is important

device is important for authentication. Imperfections, locked into structures

during fabrication, can be used to provide a fingerprint that is challenging to reproduce.

Слайд 4 Objective
To analise a proposed simple optical technique to read

ObjectiveTo analise a proposed simple optical technique to read unique information from nanometer-scale defects in 2D materials. 

unique information from nanometer-scale defects in 2D materials. 


Слайд 5 Tasks
Method
Results for WS2 from mechanically exfoliation
Results for WS2

TasksMethodResults for WS2 from mechanically exfoliationResults for WS2 from chemical vapor depositionConclusion

from chemical vapor deposition
Conclusion





Слайд 6 Method
Measurement apparatus, in which the photoluminescence from a

MethodMeasurement apparatus, in which the photoluminescence from a monolayer TMD is

monolayer TMD is collected by an objective lens (OL),

selectively transmitted through a rotatable optical bandpass filter (BPF), finally imaged on a CCD sensor. 

Слайд 7 Angular orientations of the BPF determines the center-wavelength

Angular orientations of the BPF determines the center-wavelength of its pass

of its pass band, which varies with incidence angle


Слайд 8 Concept of the angular selective transmission
Changing the BPF

Concept of the angular selective transmissionChanging the BPF angle lights up

angle lights up a random subset of pixels on

the CCD; red, green and blue conceptually correspond to positions on the monolayer TMD that emits in differing energy ranges. When no filter is present, all energies are picked up.

Слайд 9 Makeup of PUF
The BPF angular orientation θ, the corresponding

Makeup of PUFThe BPF angular orientation θ, the corresponding BPF bandwidth, and

BPF bandwidth, and the spatially varying photoluminescence of the

monolayer TMD PL makes up the physical unclonable function.

Слайд 10 Results for WS2 from mechanically exfoliation

Results for WS2 from mechanically exfoliation  50× Optical image of the

50× Optical image of the exfoliated  flake on PDMS. μ-PL map of

this flake was recorded with 532 nm excitation and 100 μW excitation power at 300 K. The integration time for each pixel is 0.5 s. 

Слайд 11 Results for WS2 from chemical vapor deposition
Angular-dependent PL

Results for WS2 from chemical vapor depositionAngular-dependent PL images of  monolayer flake,

images of  monolayer flake, excited by 450 nm laser, collected using

50×  (a)–(c) and 10×  (d)–(f) respectively.

Слайд 12 Angular dependent PL images of WS2 monolayer flake,

Angular dependent PL images of WS2 monolayer flake, excited by 450 nm

excited by 450 nm laser, imaged by a 10×  objective lens


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